Electron Beam Lithography (EBL)

  • Before creating a pattern, a resist layer (electron beam sensitive material) needs to be applied to the substrate. 
  • The sample is then exposed to the electron beam, which can either be developed as a positive resist or negative resist.
  • Subsequently there are two different types of pattern transfer, one being a material deposition and lift-off and the other being etching and resist strip
  • For deposition, a material is deposited onto the entire surface and the resist is removed, leaving a pattern of deposited material
  • For the etching, the sample is etched around the resist layer and the resist layer is removed, leaving an etched pattern

Available Equipment